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Influence of resin properties to resist performance at ArF lithography

著者名:
Yoon, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, M. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, D.Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, Y.H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, B.D. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, J.H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, K.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S.Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Chon, S.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 5 件
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
583
終了ページ:
590
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.1
資料種別:
国際会議録

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