Acid diffusion characteristics of RELACS coating for 193-nm lithography
- 著者名:
Hong, S. ( Clariant (Japan) K.K. (Japan) ) Nishibe, T. ( Clariant (Japan) K.K. (Japan) ) Okayasu, T. ( Clariant (Japan) K.K. (Japan) ) Takahashi, K. ( Clariant (Japan) K.K. (Japan) ) Takano, Y. ( Clariant (Japan) K.K. (Japan) ) Kang, W. ( Clariant (Japan) K.K. (Japan) ) Tanaka, H. ( Clariant (Japan) K.K. (Japan) ) - 掲載資料名:
- Advances in Resist Technology and Processing XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5376
- 発行年:
- 2004
- 開始ページ:
- 285
- 終了ページ:
- 293
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- 言語:
- 英語
- 請求記号:
- P63600/5376.1
- 資料種別:
- 国際会議録
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SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
国際会議録
Haze detection and haze-induced process latitude variation for low-ki 193 nm lithography [6349-105]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |