157-nm resist assessment by a full-field scanner
- 著者名:
Otoguro, A. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Ishimaru, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Itani, T. ( NEC Electronics Corp. (Japan) ) Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) - 掲載資料名:
- Advances in Resist Technology and Processing XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5376
- 発行年:
- 2004
- 開始ページ:
- 245
- 終了ページ:
- 253
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- 言語:
- 英語
- 請求記号:
- P63600/5376.1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
国際会議録
Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |