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Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography

著者名:
Hagiwara, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) and NEC Electronics Corp. (Japan) )
Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Ishikawa, T. ( Daikin Industries, Ltd. (Japan) )
Koh, M. ( Daikin Industries, Ltd. (Japan) )
Kodani, T. ( Daikin Industries, Ltd. (Japan) )
Moriya, T. ( Daikin Industries, Ltd. (Japan) )
Yamashita, T. ( Daikin Industries, Ltd. (Japan) )
Araki, T. ( Daikin Industries, Ltd. (Japan) )
Toriumi, M. ( Daikin Industries, Ltd. (Japan) )
Aoyama, H. ( Daikin Industries, Ltd. (Japan) )
さらに 7 件
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
159
終了ページ:
168
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.1
資料種別:
国際会議録

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