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High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow

著者名:
Joo, H.S. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Seo, D.C. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Kim, C.M. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Lim, Y.T. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Cho, S.D. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Lee, J.B. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Song, J.Y. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Kim, K.M. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Park, J.H. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Jung, J.C. ( Hynix Semiconductor Inc. (South Korea) )
Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )
Bok, C.K. ( Hynix Semiconductor Inc. (South Korea) )
Moon, S.C. ( Hynix Semiconductor Inc. (South Korea) )
さらに 8 件
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
126
終了ページ:
133
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.1
資料種別:
国際会議録

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1 国際会議録 Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

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