
193-nm negative resist based on acid-catalyzed elimination of polar molecules
- 著者名:
Sooriyakumaran, R. ( IBM Almaden Research Ctr. (USA) ) Davis, B.W. ( IBM Almaden Research Ctr. (USA) ) Larson, C.E. ( IBM Almaden Research Ctr. (USA) ) Brock, P.J. ( IBM Almaden Research Ctr. (USA) ) DiPietro, R.A. ( IBM Almaden Research Ctr. (USA) ) Wallow, T.I. ( IBM Almaden Research Ctr. (USA) ) Connor, E.F. ( IBM Almaden Research Ctr. (USA) ) Sundberg, L.K. ( IBM Almaden Research Ctr. (USA) ) Breyta, G. ( IBM Almaden Research Ctr. (USA) ) Allen, R.D. ( IBM Almaden Research Ctr. (USA) ) Patel, K.S. ( IBM Microelectronics Div. (USA) ) Varanasi, P.R. ( IBM Microelectronics Div. (USA) ) - 掲載資料名:
- Advances in Resist Technology and Processing XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5376
- 発行年:
- 2004
- 開始ページ:
- 71
- 終了ページ:
- 78
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- 言語:
- 英語
- 請求記号:
- P63600/5376.1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
American Chemical Society |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |