Measurements of water distribution in thin lithographic films

Measurements of water distribution in thin lithographic films

著者名:

Vogt, B.D. ( National Institute of Standards and Technology (USA) )

Soles, C.L. ( National Institute of Standards and Technology (USA) )

Prabhu, V.M. ( National Institute of Standards and Technology (USA) )

Jones, R.L. ( National Institute of Standards and Technology (USA) )

Wu, W.-L. ( National Institute of Standards and Technology (USA) )

Lin, E.K. ( National Institute of Standards and Technology (USA) )

Goldfarb, D.L. ( IBM Thomas J. Watson Research Ctr. (USA) )

Angelopoulos, M. ( IBM Thomas J. Watson Research Ctr. (USA) )

さらに 3 件

掲載資料名:

Advances in Resist Technology and Processing XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5376

発行年:

2004

開始ページ:

56

終了ページ:

62

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

言語:

英語

請求記号:

P63600/5376.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013725
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2004 : 21st
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.23-2004.02.24

類似資料:

1 国際会議録 Polymer dynamics and diffusive properties in ultrathin photoresist films Soles, C.L., Jones, R.L., Lenhart, J.L., Prabhu, V.M., Wu, W., Lin, E.K., Goldfarb, D.L., Angelopoulos, M. SPIE-The International Society for Optical Engineering	7 国際会議録 Measurement of the spatial evolution of the deprotection reaction front with nanometer resolution using neutron reflectometry Lin, E.K., Soles, C.L., Goldfarb, D.L., Trinque, B.C., Burns, S.D., Jones, R.L., Lenhart, J.L., Angelopoulos, M., … SPIE-The International Society for Optical Engineering
2 国際会議録 Polyelectrolyte effects in model photoresist developer solutions: roles of base concentration and added salts Prabhu, V.M., Jones, R.L., Lin, E.K., Soles, C.L., Wu, W., Goldfarb, D.L., Angelopoulos, M. SPIE-The International Society for Optical Engineering	8 国際会議録 X-ray absorption spectroscopy to probe interfacial issues in photolithography Lenhart, J.L., Fischer, D.A., Sambasivan, S., Lin, E.K., Jones, R.L., Soles, C.L., Wu, W., Goldfarb, D.L., Angelopoulos, … SPIE-The International Society for Optical Engineering
3 国際会議録 Deprotection volume characteristics and line-edge morphology in chemcially amplified resists Jones, R.L., Hu, T., Prabhu, V.M., Soles, C.L., Lin, E.K., Wu, W., Goldfarb, D.L., Angelopoulos, M., Trinque, B.C.], … SPIE-The International Society for Optical Engineering	9 国際会議録 Surface and bulk chemistry of chemically amplified photoresists: segregation in thin films and environmental stability issues Jablonski, E.L., Prabhu, V.M., Sambasivan, S., Fischer, D.A., Lin, E.K., Goldfarb, D.L., Angelopoulos, M., Ito, H. SPIE - The International Society of Optical Engineering
4 国際会議録 Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248-nm and 157-nm photoresists Prabhu, V.M., Wang, M.X., Jablonski, E.L., Vogt, B.D., Lin, E.K., Wu, W.-L., Goldfarb, D.L., Angelopoulos, M., Ito, H. SPIE - The International Society of Optical Engineering	10 国際会議録 Preliminary evaluation of line-edge roughness metrology based on CD-SAXS Jones, R.L., Hu, T., Soles, C.L., Lin, E.K., Wu, W.-, Casa, D.M., Mahorowala, A. SPIE - The International Society of Optical Engineering
5 国際会議録 Characterization of thin and ultrathin polymer and resist films Goldfarb,D.L., Lin,Q., Angelopoulos,M., Soles,C.L., Lin,E.K., Wu,W.-L. SPIE-The International Society for Optical Engineering	11 国際会議録 Correlation of the Reaction Front with Roughness in Chemically Amplified Photoresists Jones, Ronald L., Prabhu, Vivek M., Goldfarb, Dario L., Lin, Eric K., Soles, Christopher L., Lenhart, Joseph L., Wu, … American Chemical Society
6 国際会議録 Chain conformation in ultrathin polymer films Jones, R.L., Soles, C.L., Starr, F.W., Lin, E.K., Lenhart, J.L., Wu, W.-L., Goldfarb, D.L., Angelopoulos, M. SPIE-The International Society for Optical Engineering	12 国際会議録 Feature-shape and line-edge roughness measurement of deep submicron lithographic structures using small-angle neutron scattering Lin,E.K., Wu,W., Lin,Q., Angelopoulos,M. SPIE-The International Society for Optical Engineering

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