Blank Cover Image

Prospects for using primary electron-based CD metrology

著者名:
Rice, B.J. ( Intel Corp. (USA) )
Crays, G.L. ( Intel Corp. (USA) )
Danilevsky, A. ( Hitachi High-Technologies Corp. (USA) )
Grumski, M.G. ( Intel Corp. (USA) )
Koshihara, S. ( Hitachi Science Systems, Ltd. (Japan) )
Otaka, T. ( Hitachi High-Technologies Corp. (Japan) )
Roberts, J.M. ( Intel Corp. (USA) )
さらに 2 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5375
発行年:
2004
開始ページ:
1247
終了ページ:
1253
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
言語:
英語
請求記号:
P63600/5375.2
資料種別:
国際会議録

類似資料:

1 国際会議録 CD metrology for the 45-nm and 32-nm nodes

Rice, B.J., Cao, H.B., Chaudhuri, O., Grumski, M.G., Harteneck, B.D., Liddle, A., Olynick, D., Roberts, J.M.

SPIE - The International Society of Optical Engineering
7 国際会議録 Characterization of charging in CD-SEM for 90-nm metrology and beyond

Chen, L.-J., Lin, S.-W., Gau, T.-S., Lin, B.J.

SPIE-The International Society for Optical Engineering
2 国際会議録 Major trends in extending CD-SEM utility

B. Bunday, J. Allgair, K. Yang, S. Koshihara, H. Morokuma, A. Danilevsky, C. Parker, L. Page

SPIE - The International Society of Optical Engineering
8 国際会議録 Application of scatterometry for CD and profile metrology in 193-nm lithography process development

Chen, L.-J., Ke, C.-M., Yu, S.S., Gau, T.-S., Chen, P., Ku, Y.-C., Lin, B.J., Engelhard, D., Hetzer, D., Yang, J.Y., …

SPIE-The International Society for Optical Engineering
3 国際会議録 Automated CD-SEM recipe creation: a new paradigm in CD-SEM utilization [6152-47]

Bunday, B., Lipscomb, W., Allgair, J., Yang, K., Koshihara, S., Morokuma, H., Page, L., Danilevsky, A.

SPIE - The International Society of Optical Engineering
9 国際会議録 CD metrology on OPC features using light optical and electron optical tools

Schaetz,T., Doebereiner,S., Scheuring,G., Brueck,H.-J.

SPIE-The International Society for Optical Engineering
4 国際会議録 Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography

Ke, C.-M., Hung, H.-L., Chang, A., Chen, J.-H., Gau, T.-S., Ku, Y.-C., Lin, B.J., Otaka, T., Ueda, K., Kawada, H., …

SPIE - The International Society of Optical Engineering
10 国際会議録 Implementing flare compensation for EUV masks through localized mask CD resizing

Krautschik, C.G., Chandhok, M., Zhang, G., Lee, S.H., Goldstein, M., Panning, E.M., Rice, B.J., Bristol, R.L., Singh, V.

SPIE-The International Society for Optical Engineering
5 国際会議録 Nanometer-level metrology with a low-voltage CD SEM

Yoshimura,T., Ezumi,M., Otaka,T., Todokoro,H., Yamamoto,J., Terasawa,T.

SPIE-The International Society for Optical Engineering
11 国際会議録 Implementation of 248-nm based CD metrology for advanced reticle production

Hourd, A.C., Grimshaw, A., Scheuring, G., Gittinger, C., Doebereiner, S., Hillmann, F., Brueck, H.-J., Hartmann, H., …

SPIE-The International Society for Optical Engineering
6 国際会議録 Effect of various ArF resist shrinkage amplitudes on CD bias

Ke, C.-M., Gau, T.-S., Chen, P.-H., Yen, A., Lin, B.J., Otaka, T., Iizumi, T., Sasada, K., Ueda, K.

SPIE-The International Society for Optical Engineering
12 国際会議録 Determination of the flare specification and methods to meet the CD control requirements for the 32-nm node using EUVL

Chandhok, M., Lee, S.H., Krautschik, C., Rice, B.J., Panning, E., Goldstein, M., Shell, M.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12