Productivity and yield improvement through implementation of automated defect review SEM at 45° column tilt in a high-capacity production Fab

Productivity and yield improvement through implementation of automated defect review SEM at 45° column tilt in a high-capacity production Fab

著者名:

Tan, J. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )

Kulkarni, S. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )

Ng, S.L. ( Applied Materials South East Asia, Ltd. (Singapore) )

Jain, A. ( Applied Materials South East Asia, Ltd. (Singapore) )

Srinivasan, V. ( Applied Materials South East Asia, Ltd. (Singapore) )

Raccah, N. ( Applied Materials Israel (Israel) )

Rotlevi, O. ( Applied Materials Israel (Israel) )

さらに 2 件

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XVIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5375

発行年:

2004

開始ページ:

912

終了ページ:

920

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452887 [0819452882]

言語:

英語

請求記号:

P63600/5375.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013724
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2004 : 18th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.23-2004.02.26

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