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Belly button reduction using optimized resist filtration method in CMOS gate pattern process

著者名:
Baik, J.-H. ( DongbuAnam Semiconductor (South Korea) )
Lee, D.-J. ( DongbuAnam Semiconductor (South Korea) )
Lee, S.-H. ( DongbuAnam Semiconductor (South Korea) )
Park, S.-H. ( DongbuAnam Semiconductor (South Korea) )
Lee, I.-H. ( DongbuAnam Semiconductor (South Korea) )
Choi, J.-S. ( DongbuAnam Semiconductor (South Korea) )
さらに 1 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5375
発行年:
2004
開始ページ:
753
終了ページ:
760
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
言語:
英語
請求記号:
P63600/5375.2
資料種別:
国際会議録

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