Optimization of scatterometry parameters for shallow trench isolation (STI) monitor

Optimization of scatterometry parameters for shallow trench isolation (STI) monitor

著者名:

Leray, P.J. ( IMEC (Belgium) )
Cheng, S. ( IMEC (Belgium) )
Kremer, S. ( KLA-Tencor Corp. (France) )
Ercken, M. ( IMEC (Belgium) )
Pollentier, I. ( IMEC (Belgium) )

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XVIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5375

発行年:

2004

開始ページ:

576

終了ページ:

586

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452887 [0819452882]

言語:

英語

請求記号:

P63600/5375.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013723
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2004 : 18th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.23-2004.02.26

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