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Successful application of angular scatterometry to process control in sub-100-nm DRAM device

著者名:
Kim, J.- ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, S.-J. ( Samsung Electronics Co., Ltd. (South Korea) )
Chin, S.-B. ( Samsung Electronics Co., Ltd. (South Korea) )
Oh, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Goo, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S.-J. ( Samsung Electronics Co., Ltd. (South Korea) )
Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
Raymond, C.J. ( Accent Optical Technologies, Inc. (USA) )
Littau, M.E. ( Accent Optical Technologies, Inc. (USA) )
Youn, B.J. ( Accent Optical Technologies, Inc. (South Korea) )
Sohn, C.-J. ( Accent Optical Technologies, Inc. (South Korea) )
さらに 9 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5375
発行年:
2004
開始ページ:
541
終了ページ:
549
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
言語:
英語
請求記号:
P63600/5375.1
資料種別:
国際会議録

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