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Scatterometry feasibility studies for 0.13-micron flash memory lithography applications: enabling integrated metrology

著者名:
Lensing, K.R. ( FASL, LLC (USA) )
Miller, C. ( FASL, LLC (USA) )
Chudleigh, G. ( FASL, LLC (USA) )
Swain, B. ( Timbre Technologies, Inc. (USA) )
Laughery, M. ( Timbre Technologies, Inc. (USA) )
Viswanathan, A. ( Tokyo Electron America, Inc. (USA) )
さらに 1 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5375
発行年:
2004
開始ページ:
307
終了ページ:
316
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
言語:
英語
請求記号:
P63600/5375.1
資料種別:
国際会議録

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