Assessments on process parameters' influences to the proximity correction

Assessments on process parameters' influences to the proximity correction

著者名:

Lee, E.-M. ( Samsung Electronics Co., Ltd. (South Korea) )

Lee, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )

Lee, D.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )

Choi, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )

Park, J.-O. ( Samsung Electronics Co., Ltd. (South Korea) )

Jung, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )

Yeo, G.-S. ( Samsung Electronics Co., Ltd. (South Korea) )

Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )

Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )

Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )

さらに 5 件

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XVIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5375

発行年:

2004

開始ページ:

287

終了ページ:

295

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452887 [0819452882]

言語:

英語

請求記号:

P63600/5375.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013723
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2004 : 18th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.23-2004.02.26

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