A new analysis strategy for CD metrology using rapid photo goniometry method
- 著者名:
Petit, J. ( Electronics for Displays and Imaging Devices SA (France) ) Barritault, P. ( CEA-LETI (France) ) Hazart, J. ( CEA-LETI (France) ) Chaton, P. ( CEA-LETI (France) ) Boher, P. ( Electronics for Displays and Imaging Devices SA (France) ) Luet, M. ( Electronics for Displays and Imaging Devices SA (France) ) Leroux, T. ( Electronics for Displays and Imaging Devices SA (France) ) - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5375
- 発行年:
- 2004
- 開始ページ:
- 210
- 終了ページ:
- 221
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- 言語:
- 英語
- 請求記号:
- P63600/5375.1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
国際会議録
New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry
SPIE - The International Society of Optical Engineering |