Projection maskless lithography

Projection maskless lithography

著者名:

Brandstatter, C. ( IMS Nanofabrication GmbH (Austria) )

Loeschner, H. ( IMS Nanofabrication GmbH (Austria) )

Stengl, G. ( IMS Nanofabrication GmbH (Austria) )

Lammer, G. ( IMS Nanofabrication GmbH (Austria) )

Buschbeck, H. ( IMS Nanofabrication GmbH (Austria) )

Platzgummer, E. ( IMS Nanofabrication GmbH (Austria) )

Doring, H.-J. ( Leica Microsystems Lithography GmbH (Germany) )

Elster, T. ( Leica Microsystems Lithography GmbH (Germany) )

Fortagne, O. ( Leica Microsystems Lithography GmbH (Germany) )

さらに 4 件

掲載資料名:

Emerging Lithographic Technologies VIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5374

発行年:

2004

開始ページ:

601

終了ページ:

609

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

言語:

英語

請求記号:

P63600/5374.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013722
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2004 : 8th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.26

類似資料:

1 国際会議録 Large-field ion optics for projection and proximity printing and for maskless lithography (MLZ) Loeschner, H., Stengl, G., Buschbeck, H., Chalupka, A., Lammer, G., Platzgummer, E., Vonach, H., de Jager, P.W.H., … SPIE-The International Society for Optical Engineering	7 国際会議録 Ion Projection Direct-Structuring for Nanotechnology Applications Loeschner, Hans, Fantner, Ernest J., Korntner, Regina, Platzgummer, Elmar, Stengl, Gerhard, Zeininger, Michaela, Baglin, … Materials Research Society
2 国際会議録 Masked ion beam lithography and direct structuring on curved surfaces Loeschner, H., Buschbeck, H., Ecker, M., Horner, C., Platzgummer, E., Stengl, G., Zeininger, M., Ruchhoeft, P., Wolfe, … SPIE-The International Society for Optical Engineering	8 国際会議録 Ion Projection Lithography Stengl G., Loschner H., Hammel E., Wolf D. E., Muray J. J. Martinus Nijihoff Publishers
3 国際会議録 Demonstrators: a vital step forward for projection mask-less lithography (PML2) Brandstaetter, C., Haugeneder, E., Doering, H.-J., Elster, T., Heinitz, J., Fortagne, O., Eder-Kapl, S., Lammer, G., … SPIE - The International Society of Optical Engineering	9 国際会議録 Results obtained with the CHARPAN Engineering Tool and prospects of the ion Mask Exposure Tool (iMET) (Second Place Best Paper Award) E. Platzgummer, H. Loeschner, G. Gross Society of Photo-optical Instrumentation Engineers
4 国際会議録 Projection maskless lithography (PML2): proof-of-concept setup and first experimental results C. Klein, E. Platzgummer, H. Loeschner, G. Gross, P. Dolezel Society of Photo-optical Instrumentation Engineers	10 国際会議録 Ion projection lithography (IPL): posters presented at the 5th International SEMATECH Next-Generation Lithography (NGL) workdhop (Invited Poster) Kaesmaier, R., Loeschner, H., de Jager, P.W.H., Ehrmann, A., Hirscher, S., Kragler, K., Springer, R., Stengl, G., … SPIE-The International Society for Optical Engineering
5 国際会議録 Projection maskless patterning (PMLP) for the fabrication of leading-edge complex masks and nano-imprint templates E. Platzgummer, H. Loeschner, G. Gross Society of Photo-optical Instrumentation Engineers	11 国際会議録 Ion projection lithography (Invited Paper) Melngailis,J., Loschner,H., Stengl,G., Berry,I.L., Mondelli,A.A., Gross,G. SPIE-The International Society for Optical Engineering
6 国際会議録 Resistless Patterning of Magnetic Storage Media Using Ion Projection Structuring Dietzel, A., Berger, R., Grimm, H., Schug, C., Bruenger, W.H., Dzionk, C., Letzkus, F., Springer, R., Loeschner, H., … Materials Research Society	12 国際会議録 ION-PROJECTION LITHOGRAPHY FOR SUBMICRON MODIFICATION OF MATERIALS Stengl, G., Loschner, H., Maurer, W., Wolf, P. Materials Research Society

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