Mesoscale modeling for SFIL simulating polymerization kinetics and densification

Mesoscale modeling for SFIL simulating polymerization kinetics and densification

著者名:

Burns, R.L. ( Univ. of Texas/Austin (USA) )

Johnson, S.C. ( Univ. of Texas/Austin (USA) )

Schmid, G.M. ( Univ. of Texas/Austin (USA) )

Kim, E.K. ( Univ. of Texas/Austin (USA) )

Dickey, M.D. ( Univ. of Texas/Austin (USA) )

Meiring, J. ( Univ. of Texas/Austin (USA) )

Burns, S.D. ( IBM Thomas J. Watson Research Ctr. (USA) )

Stacey, N.A. ( Molecular Imprints, Inc. (USA) )

Willson, C.G. ( Univ. of Texas/Austin (USA) )

Convey, D. ( Motorola, Inc. (USA) )

Wei, Y. ( Motorola, Inc. (USA) )

Fejes, P. ( Motorola, Inc. (USA) )

Gehoski, K.A. ( Motorola, Inc. (USA) )

Mancini, D.P. ( Motorola, Inc. (USA) )

Nordquist, K.J. ( Motorola, Inc. (USA) )

Dauksher, W.J. ( Motorola, Inc. (USA) )

Resnick, D.J. ( Motorola, Inc. (USA) )

さらに 12 件

掲載資料名:

Emerging Lithographic Technologies VIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5374

発行年:

2004

開始ページ:

348

終了ページ:

360

総ページ数:

13

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

言語:

英語

請求記号:

P63600/5374.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013721
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2004 : 8th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.26

類似資料:

1 国際会議録 Advances in Step and Flash imprint lithography Johnson, S.C., Bailey, T.C., Dickey, M.D., Smith, B.J., Kim, E.K., Jamieson, A.T., Stacey, N.A., Ekerdt, J.G., Willson, … SPIE-The International Society for Optical Engineering	7 国際会議録 High-resolution templates for step and flash imprint lithography Resnick, D.J., Dauksher, W.J., Mancini, D.P., Nordquist, K.J., Ainley, E.S., Gehoski, K.A., Baker, J.H., Bailey, T.C., … SPIE-The International Society for Optical Engineering
2 国際会議録 Imprint lithography: lab curiosity or the real NGL (Keynote Address) Resnick, D.J., Dauksher, W.J., Mancini, D.P., Nordquist, K.J., Bailey, T.C., Johnson, S.C., Stacey, N.A., Ekerdt, J.G., … SPIE-The International Society for Optical Engineering	8 国際会議録 Critical dimension and image placement issues for step and flash imprint lithography templates Nordquist, K.J., Mancini, D.P., Dauksher, W.J., Ainley, E.S., Gehoski, K.A., Resnick, D.J., Masnyj, Z.S., Mangat, P.J.S. SPIE-The International Society for Optical Engineering
3 国際会議録 Analysis of critical dimension uniformity for Step and Flash imprint lithography Mancini, D.P., Gehoski, K.A., Dauksher, W.J., Nordquist, K.J., Resnick, D.J., Schumaker, P., McMackin, I. SPIE-The International Society for Optical Engineering	9 国際会議録 Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device Smith, B.J., Stacey, N.A., Donnelly, J.P., Onsongo, D.M., Bailey, T.C., Mackay, C.J., Resnick, D.J., Dauksher, W.J., … SPIE-The International Society for Optical Engineering
4 国際会議録 Template fabrication for sub-80-nm contact hole patterning using step and flash imprint lithography Mancini, D.P., Gehoski, K.A., Dauksher, W.J., Nordquist, K.J., Resnick, D.J., Schumaker, P., McMackin, I. SPIE - The International Society of Optical Engineering	10 国際会議録 Development of two new positive DUV photoresists for use with direct-write e-beam lithography Mancini,D.P., Resnick,D.J., Nordquist,K.J., Dauksher,W.J., Thackeray,J.W., McCord,M.A. SPIE-The International Society for Optical Engineering
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