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Optical and thermomechanical properties of plasma-enhanced CVD silicon dioxide films upon annealing

著者名:
  • Choi, D.Y. ( Samsung Advanced Institute of Technology (South Korea) )
  • You, K.H. ( Samsung Advanced Institute of Technology (South Korea) )
  • Guessel, S. ( Samsung Advanced Institute of Technology (South Korea) )
  • Jung, S.T. ( Samsung Electronics Co., Ltd. (South Korea) )
掲載資料名:
Integrated Optics: Devices, Materials, and Technologies VIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5355
発行年:
2004
開始ページ:
40
終了ページ:
51
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452634 [0819452637]
言語:
英語
請求記号:
P63600/5355
資料種別:
国際会議録

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