Improved measurement-based modeling of inverted-MSM photodetectors using on-wafer calibration structures

Improved measurement-based modeling of inverted-MSM photodetectors using on-wafer calibration structures

著者名:

Cha, C. ( Georgia Institute of Technology (USA) )
Kim, J.H. ( Georgia Institute of Technology (USA) )
Huang, Z. ( Georgia Institute of Technology (USA) )
Jokerst, N.M. ( Duke Univ. (USA) )
Brooke, M.A. ( Duke Univ. (USA) )

掲載資料名:

Semiconductor photodetectors : 28-29 January 2004, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5353

発行年:

2004

開始ページ:

89

終了ページ:

96

総ページ数:

8

出版情報:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452610 [0819452610]

言語:

英語

請求記号:

P63600/5353

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013697
シリーズID:	PA00000029
会議名:	Photonics West - Optoelectronic Materials and Devices : Semiconductor Photodetectors
回次:	2004
会議開催地:	San Jose, CA, USA
会議開催年:	2004.01.28-2004.01.29

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