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Characterization of the microloading effect in deep reactive ion etching of silicon

著者名:
  • Jensen, S. ( Technical Univ. of Demark (Denmark) )
  • Hansen, O. ( Technical Univ. of Demark (Denmark) )
掲載資料名:
Micromachining and Microfabrication Process Technology IX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5342
発行年:
2004
開始ページ:
111
終了ページ:
118
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452504 [0819452505]
言語:
英語
請求記号:
P63600/5342
資料種別:
国際会議録

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