Determination of residual stress in low-temperature PECVD silicon nitride thin films
- 著者名:
- Martyniuk, M.P. ( Univ. of Western Australia (Australia) )
- Antoszewski, J. ( Univ. of Western Australia (Australia) )
- Musca, C.A. ( Univ. of Western Australia (Australia) )
- Dell, J.M. ( Univ. of Western Australia (Australia) )
- Faraone, L. ( Univ. of Western Australia (Australia) )
- 掲載資料名:
- Device and process technologies for MEMS, microelectronics, and photonics III : 10-12 December 2003, Perth, Australia
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5276
- 発行年:
- 2004
- 開始ページ:
- 451
- 終了ページ:
- 462
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451699 [081945169X]
- 言語:
- 英語
- 請求記号:
- P63600/5276
- 資料種別:
- 国際会議録
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