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Determination of residual stress in low-temperature PECVD silicon nitride thin films

著者名:
掲載資料名:
Device and process technologies for MEMS, microelectronics, and photonics III : 10-12 December 2003, Perth, Australia
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5276
発行年:
2004
開始ページ:
451
終了ページ:
462
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451699 [081945169X]
言語:
英語
請求記号:
P63600/5276
資料種別:
国際会議録

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