Apparent positive resistance and temperature effect on I-V characteristics of RTD
- 著者名:
Miao, C. ( Tianjin Polytechnic Univ. (China) ) Guo, W. ( Tianjin Univ. (China) ) Niu, P.-J. ( Tianjin Polytechnic Univ. (China) ) Liu, H. ( Tianjin Polytechnic Univ. (China) ) Li, H.-Q. ( Tianjin Polytechnic Univ. (China) ) Qu, D. ( Tianjin Polytechnic Univ. (China) ) Xu, Z. ( Tianjin Polytechnic Univ. (China) ) - 掲載資料名:
- Device and process technologies for MEMS, microelectronics, and photonics III : 10-12 December 2003, Perth, Australia
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5276
- 発行年:
- 2004
- 開始ページ:
- 408
- 終了ページ:
- 413
- 総ページ数:
- 6
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451699 [081945169X]
- 言語:
- 英語
- 請求記号:
- P63600/5276
- 資料種別:
- 国際会議録
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