Effects of damage accumulation on quantum well intermixing by low-energy ion implantation in photonic devices
- 著者名:
Chicoine, M. ( Univ. de Montreal (Canada) ) Francois, A. ( Univ. de Sherbrooke (Canada) ) Tavares, C. ( Univ. de Sherbrooke (Canada) ) Chevobbe, S. ( Univ. de Sherbrooke (Canada) ) Schiettekatte, F. ( Univ. de Montreal (Canada) ) Aimez, V. ( Univ. de Sherbrooke (Canada) ) Beauvais, J. ( Univ. de Sherbrooke (Canada) ) Beerens, J. ( Univ. de Sherbrooke (Canada) ) - 掲載資料名:
- Applications of photonic technology 6 : closing the gap between theory, development, and application : Photonics North 2003
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5260
- 発行年:
- 2003
- 開始ページ:
- 423
- 終了ページ:
- 431
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451484 [0819451487]
- 言語:
- 英語
- 請求記号:
- P63600/5260
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
国際会議録
High-quality photonic device fabrication using low-energy-ion-implantation-induced intermixing
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |