Application of rigorous electromagnetic simulation to SLM-based maskless lithography for 65-nm node
- 著者名:
Croffie, E.H. ( LSI Logic Corp. (USA) ) Eib, N. ( LSI Logic Corp. (USA) ) Callan, N.P. ( LSI Logic Corp. (USA) ) Baba-Ali, N. ( ASML (USA) ) Latypov, A. ( ASML (USA) ) Hintersteiner, J. ( ASML (USA) ) Sandstrom, T. ( Micronic Laser Systems AB (Sweden) ) Bleeker, A. ( ASM-Lithography Research (Netherlands) ) Cummings, K.D. ( ASML (USA) ) - 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 842
- 終了ページ:
- 850
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.2
- 資料種別:
- 国際会議録
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5
国際会議録
OML: optical maskless lithography for economic design prototyping and small-volume production
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |