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Application of rigorous electromagnetic simulation to SLM-based maskless lithography for 65-nm node

著者名:
Croffie, E.H. ( LSI Logic Corp. (USA) )
Eib, N. ( LSI Logic Corp. (USA) )
Callan, N.P. ( LSI Logic Corp. (USA) )
Baba-Ali, N. ( ASML (USA) )
Latypov, A. ( ASML (USA) )
Hintersteiner, J. ( ASML (USA) )
Sandstrom, T. ( Micronic Laser Systems AB (Sweden) )
Bleeker, A. ( ASM-Lithography Research (Netherlands) )
Cummings, K.D. ( ASML (USA) )
さらに 4 件
掲載資料名:
23rd Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5256
発行年:
2003
開始ページ:
842
終了ページ:
850
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
言語:
英語
請求記号:
P63600/5256.2
資料種別:
国際会議録

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