Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
- 著者名:
Montgomery, P.K. ( IMEC (Belgium) ) Lucas, K.D. ( Motorola, Inc. (USA) ) Litt, L.C. ( Motorola, Inc. (USA) ) Conley, W. ( Motorola, Inc. (USA) ) Fanucchi, E. ( Motorola, Inc. (USA) ) Van Wingerden, J. ( Philips Research Labs. (Belgium) ) Vandenberghe, G. ( IMEC (Belgium) ) Wiaux, V. ( IMEC (Belgium) ) Taylor, D. ( Photronics, Inc. (USA) ) Cangemi, M.J. ( Photronics, Inc. (USA) ) Kasprowicz, B. ( Photronics, Inc. (USA) ) - 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 814
- 終了ページ:
- 825
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.2
- 資料種別:
- 国際会議録
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1
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Process, design, and optical proximity correction requirements for the 65-nm device generation
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国際会議録
Process, design and optical proximity correction requirements for the 65nm device generation
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