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Examination of various endpoint methods for chrome mask etch

著者名:
Collard, C. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Anderson, S.A. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Anderson, R.B., III ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Clevenger, J.O. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Halim, M. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Brooks, C.B. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Buie, M.J. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Sahin, T. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
さらに 3 件
掲載資料名:
23rd Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5256
発行年:
2003
開始ページ:
744
終了ページ:
748
総ページ数:
5
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
言語:
英語
請求記号:
P63600/5256.2
資料種別:
国際会議録

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