Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing
- 著者名:
Kim, Y.-D. ( Photronics-PKL Co., Ltd. (South Korea) ) Lee, D.-S. ( Photronics-PKL Co., Ltd. (South Korea) ) Park, D.-I. ( Photronics-PKL Co., Ltd. (South Korea) ) Kwon, H.-J. ( Photronics-PKL Co., Ltd. (South Korea) ) Kim, J.-M. ( Photronics-PKL Co., Ltd. (South Korea) ) Jung, S.-M. ( Photronics-PKL Co., Ltd. (South Korea) ) Choi, S.-S. ( Photronics-PKL Co., Ltd. (South Korea) ) - 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 392
- 終了ページ:
- 399
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.1
- 資料種別:
- 国際会議録
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