Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
- 著者名:
Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) ) Socha, R. ( ASML MaskTools, Inc. (USA) ) Hsu, S.D. ( ASML MaskTools, Inc. (USA) ) Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Laidig, T.L. ( ASML MaskTools, Inc. (USA) ) Corcoran, N. ( ASML MaskTools, Inc. (USA) ) Hollerbach, U. ( ASML MaskTools, Inc. (USA) ) Wampler, K.E. ( ASML MaskTools, Inc. (USA) ) Shi, X. ( ASML MaskTools, Inc. (USA) ) - 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 297
- 終了ページ:
- 308
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |