Printability of 2D mask quality

Printability of 2D mask quality

著者名:

Philipsen, V. ( IMEC vzw (Belgium) )
Jonckheere, R. ( IMEC vzw (Belgium) )

掲載資料名:

23rd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5256

発行年:

2003

開始ページ:

276

終了ページ:

286

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

言語:

英語

請求記号:

P63600/5256.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013600
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2003 : 23rd
会議開催地:	Monterey, California, USA
会議開催年:	2003.09.09-2003.09.12

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1 国際会議録 Printability study for phase-shift masks at 193-nm lithography Philipsen, V., Jonckheere, R.M. SPIE-The International Society for Optical Engineering	7 国際会議録 Printability of hard and soft defects in 193-nm lithography Philipsen, V., Jonckheere, R.M., Kohlpoth S., Friedrich, C.M., Torres, J.A. SPIE-The International Society for Optical Engineering
2 国際会議録 Printability of topography in alternating aperture phase-shift masks Philipsen, V. SPIE - The International Society of Optical Engineering	8 国際会議録 Determining the transfer function of a mask fabrication process Leunissen, P. L. H. A., Philipsen, V., Jonckheere, R. M. SPIE - The International Society of Optical Engineering
3 国際会議録 Extended defect printability study for 100-nm design rule using 193-nm lithography Philipsen, V., Jonckheere, R.M. SPIE-The International Society for Optical Engineering	9 国際会議録 Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications [5853-108] Philipsen, V., Leunissen, L., De Ruyter, R., Jonckheere, R., Marlin, P., Wakefield, C., Johnson, S., Cangemi, M., … SPIE - The International Society of Optical Engineering
4 国際会議録 Feature proximity errors on mask: assessment results of commercially obtained reticles Jonckheere, R.M., Potoms, G., Philipsen, V. SPIE-The International Society for Optical Engineering	10 国際会議録 OPC aware mask and wafer metrology Maurer, W., Wiaux, V., Jonckheere, R.M., Philipsen, V., Hoffmann, T., Verhaegen, S., Ronse, K.G., England, J.G., Howard, … SPIE-The International Society for Optical Engineering
5 国際会議録 Defect printability for 100-nm design rule using 193-nm lithography Philipsen, V., Jonckheere, R.M., Kohlpoth, S., Torres, A. SPIE-The International Society for Optical Engineering	11 国際会議録 Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123] Yoshizawa, M., Philipsen, V., Leunissen, A. H. L., Hendrickx, E., Jonckheere, R., Vandenberghe, G., Buttgereit, U., … SPIE - The International Society of Optical Engineering
6 国際会議録 Mask topography effect in chromeless phase lithography Philipsen, V., Bekaert, J., Vandenberghe, G., Jonckheere, R., Van Den Broeke, D., Socha, R. SPIE - The International Society of Optical Engineering	12 国際会議録 Defect printability and inspection of EUVL mask Lu, B., Wasson, J. R., Mangat, P. J. S., Cobb, J. L., Hector, S. D., Pettibone, D. W., O'Connell, D. SPIE - The International Society of Optical Engineering

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