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Template fabrication for sub-80-nm contact hole patterning using step and flash imprint lithography

著者名:
Mancini, D.P. ( Motorola, Inc. (USA) )
Gehoski, K.A. ( Motorola, Inc. (USA) )
Dauksher, W.J. ( Motorola, Inc. (USA) )
Nordquist, K.J. ( Motorola, Inc. (USA) )
Resnick, D.J. ( Motorola, Inc. (USA) )
Schumaker, P. ( Molecular Imprints, Inc. (USA) )
McMackin, I. ( Molecular Imprints, Inc. (USA) )
さらに 2 件
掲載資料名:
23rd Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5256
発行年:
2003
開始ページ:
122
終了ページ:
131
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
言語:
英語
請求記号:
P63600/5256.1
資料種別:
国際会議録

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