Blank Cover Image

Simulation of mask CD variation for different local densities with in-house developed e-beam lithography simulator

著者名:
Kim, M.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Ki, W.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S.-H. ( Samsung Advanced Institute of Technology (South Korea) )
Choi, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 1 件
掲載資料名:
23rd Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5256
発行年:
2003
開始ページ:
50
終了ページ:
58
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
言語:
英語
請求記号:
P63600/5256.1
資料種別:
国際会議録

類似資料:

1 国際会議録 Dose latitude dependency on resist contrast in e-beam mask lithography

Cha,B.-C., Moon,S.-Y., Ki,W.-T., Yang,S.-H., Choi,S.-W., Han,W.-S., Yoon,H.-S., Sohn,J.-M.

SPIE - The International Society for Optical Engineering
7 国際会議録 Distributed processing (DP) based e-beam lithography simulation with long range correction algorithm in e-beam machine

W. -T. Ki, J. -H. Choi, B. -G. Kim, S. -G. Woo, H. -K. Cho

Society of Photo-optical Instrumentation Engineers
2 国際会議録 Current status of mask CD uniformity as related to e-beam system

Lim,S.-C., Kim,B.-G., Choi,S.-W., Lee,K.-H., Cho,H.-J., Yu,Y.-H., Cho,H.-K., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
8 国際会議録 Effect of mask reduction ratio in alternating phase-shift masks

Shin,I.-G., Lee,S.-W., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M., Lim,T.-K.

SPIE-The International Society for Optical Engineering
3 国際会議録 Effect of beam blur in mask fabrication

Yang,S.-H., Ki,W.-T., Moon,S.-Y., Jeong,T.-M., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
9 国際会議録 Impact of mask CD error on wafer CD error at low-k1 photolithography

Kim, B. -G., Choi, S. -W., Choi, J. -H., Chun, C. -U., Yoon, H. -S., Sohn, J. -M.

SPIE - The International Society of Optical Engineering
4 国際会議録 CD variation sources of photomask

Kim,B.G., Choi,S.W., Yu,Y.H., Yoon,H.S., Sohn,J.M.

SPIE-The International Society for Optical Engineering
10 国際会議録 Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect

Lee, H., Yang, S.-H., Park, J.-H., Moon, S.-Y., Choi, S.-W., Sohn, J.-M.

SPIE - The International Society of Optical Engineering
5 国際会議録 Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes

Choi, Y.-H., Park, J.R., Sung, M.-G., Yang, S.-H., Kim, S.-H., Lee, H.-J., Lee, J.-Y., Jang, I.Y., Kim, Y.H., Choi, …

SPIE-The International Society for Optical Engineering
11 国際会議録 Analysis of photomask CD errors depending on development methods

Moon,S.-Y., Ki,W.-T., Cha,B.-C., Choi,S.-W., Yoon,H.-S., Sohn,J.-M.

SPIE - The International Society for Optical Engineering
6 国際会議録 Three-dimensional electron-beam lithography simulator V2.O for the gigabit-era photomask manufacturing

Kim.Y.-H, Cha.B.-C, Lee,H.-J., Sohn,J.-M., Kong,J.-T., Lee,S.-H.

SPIE-The International Society for Optical Engineering
12 国際会議録 The study to enhance the mask global CD uniformity by removing local CD variation

Y. Choi, M. Kim, O. Han

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12