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Silicon waveguide fabrication process based on the anisotropic etching of Si<111>- oriented wafers

著者名:
掲載資料名:
Advanced topics in optoelectronics, microelectronics, and nanotechnologies : 21-23 November, 2002, Bucharest, Romania
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5227
発行年:
2003
開始ページ:
288
終了ページ:
292
総ページ数:
5
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819451002 [0819451002]
言語:
英語
請求記号:
P63600/5227
資料種別:
国際会議録

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