Etching quartz with inductively coupled plasma etching equipment

Etching quartz with inductively coupled plasma etching equipment

著者名:

Wu, X. ( Shanghai Institute of Optics and Fine Mechanics (China) )

掲載資料名:

Lithographic and micromachining techniques for optical component fabrication II : 3-4 August 2003, San Diego, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5183

発行年:

2003

開始ページ:

192

終了ページ:

198

総ページ数:

7

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819450562 [0819450561]

言語:

英語

請求記号:

P63600/5183

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013149
シリーズID:	PA00000029
会議名:	Optics & Photonics : Lithographic and Micromachining Techniques for Optical Component Fabrication
回次:	2003 : 2nd
会議開催地:	San Diego, CA, USA
会議開催年:	2003.08.03-2003.08.04

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