Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment
- 著者名:
Jonckheere, R.M. ( IMEC vzw (Belgium) ) Philipsen, V. ( IMEC vzw (Belgium) ) Scheuring, G. ( MueTec GmbH (Germany) ) Hillmann, F. ( MueTec GmbH (Germany) ) Brueck, H.-J. ( MueTec GmbH (Germany) ) Ordynskyy, V. ( PDF Solutions GmbH (Germany) ) Peter, K. ( PDF Solutions GmbH (Germany) ) Hourd, A.C. ( Compugraphics International Ltd. (United Kingdom) ) Schaetz, T. ( Infineon Technologies AG (Germany) ) Chen, S.-B. ( Taiwan Mask Corp. (Taiwan) ) Chen, P.W. ( Taiwan Mask Corp. (Taiwan) ) Sommer, K. ( Karl Sommer Consulting (Germany) ) - 掲載資料名:
- 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5148
- 発行年:
- 2003
- 開始ページ:
- 158
- 終了ページ:
- 168
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819450180 [0819450189]
- 言語:
- 英語
- 請求記号:
- P63600/5148
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |