Implementation of 248-nm based CD metrology for advanced reticle production
- 著者名:
Hourd, A.C. ( Compugraphics International Ltd. (United Kingdom) ) Grimshaw, A. ( Compugraphics International Ltd. (United Kingdom) ) Scheuring, G. ( MueTec GmbH (Germany) ) Gittinger, C. ( MueTec GmbH (Germany) ) Doebereiner, S. ( MueTec GmbH (Germany) ) Hillmann, F. ( MueTec GmbH (Germany) ) Brueck, H.-J. ( MueTec GmbH (Germany) ) Hartmann, H. ( PDF Solutions GmbH (Germany) ) Ordynskyy, V. ( PDF Solutions GmbH (Germany) ) Peter, K. ( PDF Solutions GmbH (Germany) ) Chen, S.-B. ( Taiwan Mask Corp. (Taiwan) ) Chen, P.W. ( Taiwan Mask Corp. (Taiwan) ) Jonckheere, R.M. ( IMEC vzw (Belgium) ) Philipsen, V. ( IMEC vzw (Belgium) ) Schaetz, T. ( Infineon Technologies AG (Germany) ) Sommer, K. ( Karl Sommer Consulting (Germany) ) - 掲載資料名:
- 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5148
- 発行年:
- 2003
- 開始ページ:
- 148
- 終了ページ:
- 157
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819450180 [0819450189]
- 言語:
- 英語
- 請求記号:
- P63600/5148
- 資料種別:
- 国際会議録
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3
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Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment
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国際会議録
First results from a new 248-nm CD measurement system for future mask and reticle generation
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