Feature proximity errors on mask: assessment results of commercially obtained reticles

Feature proximity errors on mask: assessment results of commercially obtained reticles

著者名:

Jonckheere, R.M. ( IMEC vzw (Belgium) )
Potoms, G. ( IMEC vzw (Belgium) )
Philipsen, V. ( IMEC vzw (Belgium) )

掲載資料名:

19th European Conference on Mask Technology for Integrated Circuits and Microcomponents

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5148

発行年:

2003

開始ページ:

128

終了ページ:

137

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819450180 [0819450189]

言語:

英語

請求記号:

P63600/5148

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013133
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
回次:	2003 : 19th
会議開催地:	Sonthofen, Germany
会議開催年:	2003.01.13-2003.01.15

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