Printability study for phase-shift masks at 193-nm lithography
- 著者名:
- Philipsen, V. ( IMEC vzw (Belgium) )
- Jonckheere, R.M. ( IMEC vzw (Belgium) )
- 掲載資料名:
- 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5148
- 発行年:
- 2003
- 開始ページ:
- 79
- 終了ページ:
- 89
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819450180 [0819450189]
- 言語:
- 英語
- 請求記号:
- P63600/5148
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
7
国際会議録
Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |