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Development and characterization of new CD mask standards: a status report

著者名:
Schaetz, T. ( Infineon Technologies AG (Germany) )
Hauffe, B. ( Photronics MZD GmbH and Co. KG (Germany) )
Doebereiner, S. ( MueTec GmbH (Germany) )
Brueck, H.-J. ( MueTec GmbH (Germany) )
Brendel, B. ( Leica Microsystems Lithography GmbH (Germany) )
Bettin, L. ( Leica Microsystems Lithography GmbH (Germany) )
Roeth, K.-D. ( Leica Microsystems Wetzlar GmbH (Germany) )
Steinberg, W. ( Leica Microsystems Wetzlar GmbH (Germany) )
Speckbacher, P. ( Dr. Johannes Heidenhain GmbH (Germany) )
Sedlmeier, W. ( Dr. Johannes Heidenhain GmbH (Germany) )
Engel, T. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
Haessler-Grohne, W. ( Physikalisch-Technische Bundesanstalt (Germany) )
Mirande, W. ( Physikalisch-Technische Bundesanstalt (Germany) )
Bosse, H. ( Physikalisch-Technische Bundesanstalt (Germany) )
さらに 9 件
掲載資料名:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5148
発行年:
2003
開始ページ:
42
終了ページ:
53
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819450180 [0819450189]
言語:
英語
請求記号:
P63600/5148
資料種別:
国際会議録

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