Investigation of phase variation impact on CPL PSM for low k1 imaging

Investigation of phase variation impact on CPL PSM for low k1 imaging

著者名:

Lin, C. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )

Hsu, M. ( ASML MaskTools, Inc. (USA) )

Hsieh, F. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )

Lin, S.Y. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )

Hsu, S.D. ( ASML MaskTools, Inc. (USA) )

Shi, X. ( ASML MaskTools, Inc. (USA) )

Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) )

Chen, J.F. ( ASML MaskTools, Inc. (USA) )

Tang, F.C. ( Winbond Electronics Corp. (Taiwan) )

Hsieh, W.A. ( Winbond Electronics Corp. (Taiwan) )

Huang, C.Y. ( Winbond Electronics Corp. (Taiwan) )

さらに 6 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5130

発行年:

2003

開始ページ:

804

終了ページ:

811

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

言語:

英語

請求記号:

P63600/5130

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013118
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2003 : 10th
会議開催地:	Yokohama, Japan
会議開催年:	2003.04.16-2003.04.18

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