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Phase defect printability analysis for chromeless phase lithography technology

著者名:
Huh, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, J.H. ( Samsung Electronics Co., Ltd. (South Korea) )
Chung, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, C.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Shin, I.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 2 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology X
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5130
発行年:
2003
開始ページ:
787
終了ページ:
795
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
言語:
英語
請求記号:
P63600/5130
資料種別:
国際会議録

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