Phase defect printability of alternating phase shift masks for ArF lithography

Phase defect printability of alternating phase shift masks for ArF lithography

著者名:

Ohba, N. ( Sony Corp. (Japan) )
Ishikawa, K. ( Sony Corp. (Japan) )
Katsumata, M. ( Sony Corp. (Japan) )
Ohnuma, H. ( Sony Corp. (Japan) )

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5130

発行年:

2003

開始ページ:

756

終了ページ:

765

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

言語:

英語

請求記号:

P63600/5130

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013118
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2003 : 10th
会議開催地:	Yokohama, Japan
会議開催年:	2003.04.16-2003.04.18

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