Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography
- 著者名:
- Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Kurose, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 736
- 終了ページ:
- 744
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
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