Unified mask data formats for EB writers
- 著者名:
Kuriyama, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Suzuki, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Hirumi, J. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Hojo, Y. ( Hitachi High-Technologies Corp. (Japan) ) Kawase, Y. ( JEOL Ltd. (Japan) ) Hara, S. ( NuFlare Technology Inc. (Japan) ) Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) ) Watanabe, S.W. ( Dai Nippon Printing Co., Ltd. (Japan) ) Inoue, M. ( Seiko Instruments Inc. (Japan) ) Kawase, H. ( Seiko Instruments Inc. (Japan) ) Kamimoto, T. ( Seiko Instruments Inc. (Japan) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 660
- 終了ページ:
- 671
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |