Fourier analysis of AIMS images for mask characterization
- 著者名:
- Koehle, R. ( Infineon Technologies AG (Germany) )
- Dettmann, W. ( Infineon Technologies AG (Germany) )
- Verbeek, M. ( Infineon Technologies AG (Germany) )
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 545
- 終了ページ:
- 554
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
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