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Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results

著者名:
Dettmann, W. ( Infineon Technologies AG (Germany) )
Heumann, J.P. ( Infineon Technologies AG (Germany) )
Hagner, T. ( Infineon Technologies AG (Germany) )
Koehle, R. ( Infineon Technologies AG (Germany) )
Rahn, S. ( Infineon Technologies AG (Germany) )
Verbeek, M. ( Infineon Technologies AG (Germany) )
Zarrabian, M. ( Infineon Technologies AG (Germany) )
Weckesser, J. ( Infineon Technologies AG (Germany) )
Hennig, M. ( Infineon Technologies AG (Germany) )
Morgana, N. ( Infineon Technologies AG (Germany) )
さらに 5 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology X
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5130
発行年:
2003
開始ページ:
415
終了ページ:
422
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
言語:
英語
請求記号:
P63600/5130
資料種別:
国際会議録

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