A study of post-exposure baking effect for CAR process in photomask fabrication
- 著者名:
Park, D.-I. ( Photronics-PKL (South Korea) ) Seo, S.-K. ( Photronics-PKL (South Korea) ) Jeong, W.-G. ( Photronics-PKL (South Korea) ) Park, E.-S. ( Photronics-PKL (South Korea) ) Lee, J.-H. ( Photronics-PKL (South Korea) ) Kwon, H.-J. ( Photronics-PKL (South Korea) ) Kim, J.-M. ( Photronics-PKL (South Korea) ) Jung, S.-M. ( Photronics-PKL (South Korea) ) Choi, S.-S. ( Photronics-PKL (South Korea) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 190
- 終了ページ:
- 196
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
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