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Mask cost and cycle time reduction (Invited Paper)

著者名:
Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd (Taiwan) )
Hung, J.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chin, A.S.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lee, S.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Shin, J.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Liu, R.G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
さらに 2 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology X
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5130
発行年:
2003
開始ページ:
4
終了ページ:
15
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
言語:
英語
請求記号:
P63600/5130
資料種別:
国際会議録

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