Cost and revenue impact of advanced process control (APC) with an emphasis on run-to-run control (R2R)

Cost and revenue impact of advanced process control (APC) with an emphasis on run-to-run control (R2R)

著者名:

Stanley, T.D. ( International SEMATECH (USA) )

Markle, R.J. ( Advanced Micro Devices, Inc. (USA) )

Eck, B.V. ( International SEMATECH (USA) )

Cusson, B.K. ( Advanced Micro Devices, Inc. (USA) )

Purdy, M.A. ( Advanced Micro Devices, Inc. (USA) )

Stanley, K.J. ( International SEMATECH (USA) )

さらに 1 件

掲載資料名:

Advanced process control and automation : 27 February, 2003, Santa Clara, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5044

発行年:

2003

開始ページ:

130

終了ページ:

138

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448491 [0819448494]

言語:

英語

請求記号:

P63600/5044

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013035
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Advanced process control and automation
回次:	2003
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.03.27

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