Applications of image diagnostics to metrology quality assurance and process control

Applications of image diagnostics to metrology quality assurance and process control

著者名:

Allgair, J.A. ( Motorola, Inc. (USA) )

Boksha, V.V. ( Boksha Global Partners LP (USA) )

Bunday, B.D. ( International SEMATECH (USA) )

Diebold, A.C. ( International SEMATECH (USA) )

Cole, D.C. ( Boston Univ. (USA) )

Davidson, M.P. ( Spectel Research Corp. (USA) )

Hutcheson, J.D. ( VLSI Research, Inc. (USA) )

Gurnell, A.W. ( M2C Services (United Kingdom) )

Joy, D.C. ( Univ. of Tennessee/Knoxville (USA) )

McIntosh, J.M.

Muckenhirn, S.G.

Pellegrini, J.C. ( New Vision Systems (USA) )

Larrabee, R.D. ( National Institute of Standards and Technology (USA) )

Potzick, J.E.

Vlada, A.E.

Smith, N.P. ( Accent Optical Technologies (United Kingdom) )

Starikov, A. ( Intel Corp. (USA) )

Sulivan, N.T. ( Schlumberger Technologies, Inc. (USA) )

Wells, O.C. ( IBM Corp. (USA) )

さらに 14 件

掲載資料名:

Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5042

発行年:

2003

開始ページ:

251

終了ページ:

277

総ページ数:

27

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448477 [0819448478]

言語:

英語

請求記号:

P63600/5042

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013033
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Design and process integration for microelectronic manufacturing
回次:	2003 : 2nd
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.26-2003.02.28

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